Application Scenario of cryogenic air separation units:
Electronics and Semiconductor Industry
The cryogenic air separation plant plays a vital role in the electronics and semiconductor industry, particularly in the production of high-purity nitrogen and oxygen. In this application scenario, the oxygen/ nitrogen/ argon plant is employed to separate atmospheric air into its primary components using cryogenic distillation. The resulting nitrogen and oxygen are further purified to achieve the required levels of purity demanded by the electronics industry. High-purity nitrogen is utilized for various applications, including inerting, purging, and as a carrier gas in the production of electronic components. Oxygen, on the other hand, is employed for oxidation processes, gas-phase doping, and as a source of reactive oxygen species in semiconductor manufacturing. The cryogenic air separation plant's capability to deliver high-purity gases with low impurity levels ensures the reliability and quality of electronic and semiconductor production processes.
Medium & Large Size Air Separation Unit With Argon Data Sheet |
Model | Production Capacity | Production Purity or Impurity |
Oxygen
(Nm³/h) | Nitrogen
(Nm³/h) | Argon
(Nm³/h) | Oxygen
(%) | Nitrogen
(PPM O2) | Argon |
KDONAr-3200/6400/100 | 3200 | 6400 | 100 | 99.6 | ≤10 | ≤1.5PPM O2+3PPM N2 |
KDONAr-6000 / 12000 / 180 | 6000 | 12000 | 180 | 99.6 | ≤10 | ≤1.5PPM O2+3PPM N2 |
KDONAr-10000 / 20000 / 330 | 10000 | 20000 | 330 | 99.6 | ≤10 | ≤1.5PPM O2+3PPM N2 |
KDONAr-20000 / 40000 / 650 | 20000 | 40000 | 650 | 99.6 | ≤10 | ≤1.5PPM O2+3PPM N2 |
KDONAr-40000 / 80000 / 1200 | 40000 | 80000 | 1200 | 99.6 | ≤10 | ≤1.5PPM O2+3PPM N2 |
KDONAr-80000 / 130000 / 2400 | 80000 | 130000 | 2400 | 99.6 | ≤10 | ≤1.5PPM O2+3PPM N2 |
